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EnglishIon implantation in glasses produces structure modifications at depths greater than those of the implanted ion range. Such a result is evidenced by means of leaching experiments, alkali element depletion, distribution of gaseous implanted species, etching rate as function of depth. A systematic study with the aim to evidence a threshold in the nuclear deposited energy for defect diffusion is presented. Fourier transform infrared spectroscopy measurements confirm the glass modifications at extended depths.
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http://hdl.handle.net/11572/91776| Titolo: | Defect diffusion in ion-implanted glasses |
| Autori Unitn: | Miotello, Antonio |
| Anno di pubblicazione: | 1992 |
| Titolo del periodico: | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH. SECTION B, BEAM INTERACTIONS WITH MATERIALS AND ATOMS |
| Abstract: | Ion implantation in glasses produces structure modifications at depths greater than those of the implanted ion range. Such a result is evidenced by means of leaching experiments, alkali element depletion, distribution of gaseous implanted species, etching rate as function of depth. A systematic study with the aim to evidence a threshold in the nuclear deposited energy for defect diffusion is presented. Fourier transform infrared spectroscopy measurements confirm the glass modifications at extended depths. |
| Handle: | http://hdl.handle.net/11572/91776 |
| Appare nelle tipologie: | 03.1 Articolo su rivista (Journal article) |
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