Deposition by pulsed erosion of nickel and aluminum on copper

In order to produce highly adherent coatings, various techniques are available, each of them presenting favourable and negative aspects. In this paper we present the novel method of deposition by pulsed erosion for obtaining relatively thick layers on different substrates. In particular we examine here coatings of Ni or Al on copper substrates. High intensity pulsed ion beams were generated in a rod plasma injector machine, equipped with coaxial-grid-type electrodes. Several pulses of plasma containing ions of the discharge gas argon and eroded Ni (Al) material were used to irradiate separately the substrates. The energy density of pulses was in the range 4-6 J cm-2, with an ion mean kinetic energy of the order of 10 keV, The samples were analysed by scanning electron microscopy, X-ray diffractometry and secondary-neutral mass spectrometry.



Titolo: Deposition by pulsed erosion of nickel and aluminum on copper
Autori: J., Langner; J., Piekoszewski; C., Pochrybniak; F., Rosatelli; S., Rizzo; J., Kucinski; Miotello, Antonio; L., Guzman; P., Lazzeri
Autori Unitn: 
Miotello, Antonio
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Titolo del periodico: SURFACE & COATINGS TECHNOLOGY
Anno di pubblicazione: 1994
Numero e parte del fascicolo: n. 1-3
Codice identificativo Scopus: 2-s2.0-0028133915
Codice identificativo ISI: WOS:A1994PA17200016
Digital Object Identifier (DOI): http://dx.doi.org/10.1016/0257-8972(94)90017-5
Handle: http://hdl.handle.net/11572/91726
Appare nelle tipologie:03.1 Articolo su rivista (Journal article)

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