Amorphous a-SiC films were deposited by rf magnetron sputtering on stainless steel and N+ implantations were performed at room temperature over a fluence range of 1X10(16)-1X10(17) ions/cm2 at 30 and 160 keV Chemical characterization of the a-SiC/steel interface and compositional depth profiles were obtained by Auger electron spectroscopy. Adhesion properties of the films were examined using a scratch tester in conjunction with scanning electron microscopy. A strong adhesion enhancement (about a factor of eight) along with an improvement of the fracture toughness were observed in the implanted a-SiC/steel specimens. The key mechanisms envisaged to explain the enhanced adhesion is mainly related to the new chemical bondings, involving C and N in Si-(N,C)-Cr complexes formation at the a-SiC/steel interface.
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Titolo: | N+-implantation induced enhanced adhesion of amorphous-sic films deposited on stainless-steel | |
Autori: | N., Laidani; Miotello, Antonio; L., Guzman; L., Calliari | |
Autori Unitn: | ||
Titolo del periodico: | APPLIED PHYSICS LETTERS | |
Anno di pubblicazione: | 1994 | |
Numero e parte del fascicolo: | n. 8 | |
Codice identificativo Scopus: | 2-s2.0-0343582186 | |
Codice identificativo WOS: | WOS:A1994MX44800012 | |
Digital Object Identifier (DOI): | http://dx.doi.org/10.1063/1.110924 | |
Handle: | http://hdl.handle.net/11572/91721 | |
Appare nelle tipologie: | 03.1 Articolo su rivista (Journal article) |