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EnglishAmorphous a-SiC films were deposited by rf magnetron sputtering on stainless steel and N+ implantations were performed at room temperature over a fluence range of 1X10(16)-1X10(17) ions/cm2 at 30 and 160 keV Chemical characterization of the a-SiC/steel interface and compositional depth profiles were obtained by Auger electron spectroscopy. Adhesion properties of the films were examined using a scratch tester in conjunction with scanning electron microscopy. A strong adhesion enhancement (about a factor of eight) along with an improvement of the fracture toughness were observed in the implanted a-SiC/steel specimens. The key mechanisms envisaged to explain the enhanced adhesion is mainly related to the new chemical bondings, involving C and N in Si-(N,C)-Cr complexes formation at the a-SiC/steel interface.
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| Titolo: | N+-implantation induced enhanced adhesion of amorphous-sic films deposited on stainless-steel |
| Autori Unitn: | |
| Anno di pubblicazione: | 1994 |
| Titolo del periodico: | |
| Abstract: | Amorphous a-SiC films were deposited by rf magnetron sputtering on stainless steel and N+ implantations were performed at room temperature over a fluence range of 1X10(16)-1X10(17) ions/cm2 at 30 and 160 keV Chemical characterization of the a-SiC/steel interface and compositional depth profiles were obtained by Auger electron spectroscopy. Adhesion properties of the films were examined using a scratch tester in conjunction with scanning electron microscopy. A strong adhesion enhancement (about a factor of eight) along with an improvement of the fracture toughness were observed in the implanted a-SiC/steel specimens. The key mechanisms envisaged to explain the enhanced adhesion is mainly related to the new chemical bondings, involving C and N in Si-(N,C)-Cr complexes formation at the a-SiC/steel interface. |
| Handle: | http://hdl.handle.net/11572/91721 |
| Appare nelle tipologie: | 03.1 Articolo su rivista (Journal article) |
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