The purpose of this paper is to present first results of an investigation on the properties of boron-nitrogen thin films obtained by different deposition techniques. Films of different stoichiometries were produced on silicon substrates using r.f. magnetron sputtering and ion-beam-assisted deposition. In order to study the influence of the deposition process parameters on the film properties, the films were characterized by scanning electron microscopy. Auger electron spectroscopy, secondary neutral mass spectrometry, IR spectroscopy and nanoindentation. With the chosen experimental conditions, only hexagonal BN is formed. A considerable dependence of hardness of film microstructure has been evidenced.