We have investigated by numerical simulations the gas-phase chemistry of a typical radio frequency, low pressure CH4/Ar plasma used for the deposition of diamond and diamond-like carbon ®lms. We ®nd that CH3 is the most abundant carbon containing radical in pure methane discharges, while it is the carbon dimer C2 in discharges of methane highly diluted by argon. Thus, we propose that the gaseous precursor of the ®lm is CH3 in methane plasmas, and C2 in CH4/Ar plasmas.

Gaseous precursors of diamond-like carbon films in CH4/Ar plasmas / C., Riccardi; R., Barni; M., Fontanesi; Tosi, Paolo. - In: CHEMICAL PHYSICS LETTERS. - ISSN 0009-2614. - STAMPA. - 329:1-2(2000), pp. 66-70. [10.1016/S0009-2614(00)00949-0]

Gaseous precursors of diamond-like carbon films in CH4/Ar plasmas

Tosi, Paolo
2000-01-01

Abstract

We have investigated by numerical simulations the gas-phase chemistry of a typical radio frequency, low pressure CH4/Ar plasma used for the deposition of diamond and diamond-like carbon ®lms. We ®nd that CH3 is the most abundant carbon containing radical in pure methane discharges, while it is the carbon dimer C2 in discharges of methane highly diluted by argon. Thus, we propose that the gaseous precursor of the ®lm is CH3 in methane plasmas, and C2 in CH4/Ar plasmas.
2000
1-2
C., Riccardi; R., Barni; M., Fontanesi; Tosi, Paolo
Gaseous precursors of diamond-like carbon films in CH4/Ar plasmas / C., Riccardi; R., Barni; M., Fontanesi; Tosi, Paolo. - In: CHEMICAL PHYSICS LETTERS. - ISSN 0009-2614. - STAMPA. - 329:1-2(2000), pp. 66-70. [10.1016/S0009-2614(00)00949-0]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11572/74607
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