95.8SiO(2)-4.2HfO(2) planar waveguide activated by 0.2 mol% Er and 0.2 mol% Yb was fabricated by multi-target rf-sputtering technique. The optical parameters were measured by an m-line apparatus operating at 543.5, 632.8, 1319 and 1542 nm. The waveguide compositions were investigated by energy dispersive spectroscopy. The waveguide exhibits a single propagation mode at 1.3 and 1.5 mu m with an attenuation coefficient of 0.2 dB/cm at 1.5 mu m. The emission of (4)vertical bar(13/2) -> (4)vertical bar(15/2) transition of Er3+ ion, with a 42 nm bandwidth was observed upon TE0 mode excitation at 980 and 514.5 nm. Photoluminescence excitation spectroscopy was used to obtain information about the effective excitation efficiency of Er3+ ions by co-doping with Yb3+ ions. Channel waveguide in rib configuration were fabricated by wet etching process in the active film. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.

Er3+/Yb3+-activated silica-hafnia planar waveguides for photonics fabricated by rf-sputtering / Chiasera, A; Armellini, C; Bhaktha, Snb; Chiappini, A; Jestin, Y; Ferrari, M; Moser, E; Coppa, A; Foglietti, V; Huy, Pt; Ngoc, Kt; Conti, Gn; Pelli, S; Righini, Gc; Speranza, G. - In: JOURNAL OF NON-CRYSTALLINE SOLIDS. - ISSN 0022-3093. - 355:18-21(2009), pp. 1176-1179. [10.1016/j.jnoncrysol.2008.11.039]

Er3+/Yb3+-activated silica-hafnia planar waveguides for photonics fabricated by rf-sputtering

Chiasera A;
2009

Abstract

95.8SiO(2)-4.2HfO(2) planar waveguide activated by 0.2 mol% Er and 0.2 mol% Yb was fabricated by multi-target rf-sputtering technique. The optical parameters were measured by an m-line apparatus operating at 543.5, 632.8, 1319 and 1542 nm. The waveguide compositions were investigated by energy dispersive spectroscopy. The waveguide exhibits a single propagation mode at 1.3 and 1.5 mu m with an attenuation coefficient of 0.2 dB/cm at 1.5 mu m. The emission of (4)vertical bar(13/2) -> (4)vertical bar(15/2) transition of Er3+ ion, with a 42 nm bandwidth was observed upon TE0 mode excitation at 980 and 514.5 nm. Photoluminescence excitation spectroscopy was used to obtain information about the effective excitation efficiency of Er3+ ions by co-doping with Yb3+ ions. Channel waveguide in rib configuration were fabricated by wet etching process in the active film. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.
18-21
Chiasera, A; Armellini, C; Bhaktha, Snb; Chiappini, A; Jestin, Y; Ferrari, M; Moser, E; Coppa, A; Foglietti, V; Huy, Pt; Ngoc, Kt; Conti, Gn; Pelli, S; Righini, Gc; Speranza, G
Er3+/Yb3+-activated silica-hafnia planar waveguides for photonics fabricated by rf-sputtering / Chiasera, A; Armellini, C; Bhaktha, Snb; Chiappini, A; Jestin, Y; Ferrari, M; Moser, E; Coppa, A; Foglietti, V; Huy, Pt; Ngoc, Kt; Conti, Gn; Pelli, S; Righini, Gc; Speranza, G. - In: JOURNAL OF NON-CRYSTALLINE SOLIDS. - ISSN 0022-3093. - 355:18-21(2009), pp. 1176-1179. [10.1016/j.jnoncrysol.2008.11.039]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11572/343034
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