A report on the light amplification dynamics of stimulated emission in silicon nanocrystals (Si-nc) was presented. Si-nc samples were produced by high-temperature annealing of substoichiometric silicon oxide (SiOx) thin films grown by plasma-enhanced chemical vapor deposition on a quartz substrate. The optical confinement factor of the wave-guide was estimated to be 74%.

Dynamics of stimulated emission in silicon nanocrystals

Cazzanelli, Massimo;Pavesi, Lorenzo;
2003-01-01

Abstract

A report on the light amplification dynamics of stimulated emission in silicon nanocrystals (Si-nc) was presented. Si-nc samples were produced by high-temperature annealing of substoichiometric silicon oxide (SiOx) thin films grown by plasma-enhanced chemical vapor deposition on a quartz substrate. The optical confinement factor of the wave-guide was estimated to be 74%.
2003
26
L., Dal Negro; Cazzanelli, Massimo; Pavesi, Lorenzo; S., Ossicini; D., Pacifici; G., Franzo'; F., Priolo; F., Iacona
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11572/23931
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